Fusion Select Electrical E-chips provide a platform for precise electrical biasing in current or voltage mode. The electrical stimuli are delivered to your sample via electrodes patterned directly on the E-chips. Typically platinum or tungsten deposition is used to create the electrical contact. EM imaging of samples is performed in the area around and between the electrodes.
Electrical E-chips are offered with several patterns and features so that you can select the best E-chip for a particular sample and experiment. You can choose between gold and platinum for the electrode material and whether to have holes in the silicon nitride membrane. Nanowires, carbon nanotubes, graphene, patterned semiconductor or metallic thin films are compatible with all E-chip patterns.
A quantity of 1 of any part number indicates 1 box of E-chips. Each box contains 10 E-chips.
**Note: there is a layer of photoresist on all Fusion electrical E-chips that must be removed before depositing samples. See the photoresist removal guide in the Protochips Success Community at success.protochips.com
E-chips are backwards compatible to last generation Fusion and legacy Aduro systems.
When preparing metallic thin films on any Fusion E-chip, ensure the E-chip is masked so electrical shorts do not occur. Ask us about our Shadow Mask tool to help with this!
• Chip dimensions: 4 mm x 4.65 mm
• Chip thickness: 300 μm
• Sample support: ~50 nm thick silicon nitride
• Electrode Width: 14 µm
• Electrode Spacing: Narrow - 5µm | Wide - 20 µm
• Hole Size (when present): Diameter - 5 µm | Spacing - 10 µm
All feature dimensions listed should be considered nominal. Variations in dimensions can occur.